JPH0128507B2 - - Google Patents
Info
- Publication number
- JPH0128507B2 JPH0128507B2 JP56097422A JP9742281A JPH0128507B2 JP H0128507 B2 JPH0128507 B2 JP H0128507B2 JP 56097422 A JP56097422 A JP 56097422A JP 9742281 A JP9742281 A JP 9742281A JP H0128507 B2 JPH0128507 B2 JP H0128507B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- oxide film
- polycrystalline silicon
- layer
- silicon oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56097422A JPS58172A (ja) | 1981-06-25 | 1981-06-25 | 半導体集積回路装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56097422A JPS58172A (ja) | 1981-06-25 | 1981-06-25 | 半導体集積回路装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58172A JPS58172A (ja) | 1983-01-05 |
JPH0128507B2 true JPH0128507B2 (en]) | 1989-06-02 |
Family
ID=14191990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56097422A Granted JPS58172A (ja) | 1981-06-25 | 1981-06-25 | 半導体集積回路装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58172A (en]) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH077503B2 (ja) * | 1985-10-24 | 1995-01-30 | ティーディーケイ株式会社 | 磁気記録媒体及びその製造方法 |
JPS6341074A (ja) * | 1986-08-06 | 1988-02-22 | Mitsubishi Electric Corp | 半導体集積回路装置およびその製造方法 |
JPS6336567A (ja) * | 1986-07-30 | 1988-02-17 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
JPS63107167A (ja) * | 1986-10-24 | 1988-05-12 | Oki Electric Ind Co Ltd | 半導体集積回路装置の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5427774A (en) * | 1977-08-03 | 1979-03-02 | Nec Corp | Semiconductor device |
-
1981
- 1981-06-25 JP JP56097422A patent/JPS58172A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58172A (ja) | 1983-01-05 |
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